HiPIMS Forum
HIPIMS Forum, TACT2021 will provide a platform for seven invited speakers from research institute, industry and academia in Europe, North America, and Asia. These expert speakers will present the fundamental scientific aspects, the latest application-oriented results, and the real applications of HiPIMS in industries. Attendees can discuss with our invited speakers during the Q & A time.
Program of HiPIMS Forum, TACT2021
Tuesday, November 16, 2021 |
14:20-14:25 GMT+8 (Taiwan Standard Time) | Opening Prof. Jyh-Wei Lee |
14:25-14:45 | Topic: High-Quality CMOS-compatible TiN Thin Films for Next Generation Optoelectronic and Plasmonic Devices Prof. Arutiun P. Ehiasarian Sheffield Hallam University, Sheffield, UK |
14:45-15:05 | Topic: Using optical emission for control of ionization and stoichiometry in metallic and reactive HIPIMS processes Dr. Ralf Bandorf Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany |
15:05-15:25 | Topic: Beyond HIPIMS – smooth, defect free coatings for demanding cutting tool applications Dr. Denis Kurapov Global Market Segment Manager, Cutting tools at Oerlikon Balzers, Germany |
15:25-15:45 | Topic: Optimizing the deposition rate and the ionized flux fraction in high power impulse magnetron sputtering Prof. Jón Tómas Guðmundsson University of Iceland, Iceland |
15:45-16:05 | Topic: Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias Prof. Tetsuhide Shimizu Tokyo Metropolitan University |
16:05-16:25 | Topic: Research and industrial applications of HiPIMS technology in Taiwan Prof. Jyh-Wei Lee Ming Chi University of Technology, Taiwan |
16:25-17:00 | Q & A Prof. Jyh-Wei Lee and Invited speakers |