HiPIMS Forum

HIPIMS Forum, TACT2021 will provide a platform for seven invited speakers from research institute, industry and academia in Europe, North America, and Asia. These expert speakers will present the fundamental scientific aspects, the latest application-oriented results, and the real applications of HiPIMS in industries. Attendees can discuss with our invited speakers during the Q & A time.


Program of HiPIMS Forum, TACT2021 

Tuesday, November 16, 2021


GMT+8 (Taiwan Standard Time)


Prof. Jyh-Wei Lee


Topic: High-Quality CMOS-compatible TiN Thin Films for Next Generation Optoelectronic and Plasmonic Devices

Prof. Arutiun P. Ehiasarian

Sheffield Hallam University, Sheffield, UK


Topic: Using optical emission for control of ionization and stoichiometry in metallic and reactive HIPIMS processes

Dr. Ralf Bandorf

Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany


Topic: Beyond HIPIMS – smooth, defect free coatings for demanding cutting tool applications

Dr. Denis Kurapov

Global Market Segment Manager, Cutting tools at Oerlikon Balzers, Germany


Topic: Optimizing the deposition rate and the ionized flux fraction in high power impulse magnetron sputtering

Prof. Jón Tómas Guðmundsson

University of Iceland, Iceland


Topic: Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias

Prof. Tetsuhide Shimizu

Tokyo Metropolitan University


Topic: Research and industrial applications of HiPIMS technology in Taiwan

Prof. Jyh-Wei Lee

Ming Chi University of Technology, Taiwan


Q & A

Prof. Jyh-Wei Lee and Invited speakers