HiPIMS Forum

HIPIMS Forum, TACT2021 will provide a platform for seven invited speakers from research institute, industry and academia in Europe, North America, and Asia. These expert speakers will present the fundamental scientific aspects, the latest application-oriented results, and the real applications of HiPIMS in industries. Attendees can discuss with our invited speakers during the Q & A time.

  

Program of HiPIMS Forum, TACT2021 

Tuesday, November 16, 2021

14:20-14:25

GMT+8 (Taiwan Standard Time)

Opening

Prof. Jyh-Wei Lee

14:25-14:45

Topic: High-Quality CMOS-compatible TiN Thin Films for Next Generation Optoelectronic and Plasmonic Devices

Prof. Arutiun P. Ehiasarian

Sheffield Hallam University, Sheffield, UK

14:45-15:05

Topic: Using optical emission for control of ionization and stoichiometry in metallic and reactive HIPIMS processes

Dr. Ralf Bandorf

Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany

15:05-15:25

Topic: Beyond HIPIMS – smooth, defect free coatings for demanding cutting tool applications

Dr. Denis Kurapov

Global Market Segment Manager, Cutting tools at Oerlikon Balzers, Germany

15:25-15:45

Topic: Optimizing the deposition rate and the ionized flux fraction in high power impulse magnetron sputtering

Prof. Jón Tómas Guðmundsson

University of Iceland, Iceland

15:45-16:05

Topic: Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias

Prof. Tetsuhide Shimizu

Tokyo Metropolitan University

16:05-16:25

Topic: Research and industrial applications of HiPIMS technology in Taiwan

Prof. Jyh-Wei Lee

Ming Chi University of Technology, Taiwan

16:25-17:00

Q & A

Prof. Jyh-Wei Lee and Invited speakers